Search

Filters

Use filters to refine the search results.

Now showing items 1-2 of 2

Implications of fin width scaling on variability and reliability of high-k metal gate FinFETs

CHABUKSWAR, S; MAJI, D; MANOJ, CR; ANIL, KG; RAO, VR; CRUPI, F; MAGNONE, P; GIUSI, G; PACE, C; COLLAERT, N (ELSEVIER SCIENCE BV, 2010)
Fabrication and Analysis of a Si/Si0.55Ge0.45 Heterojunction Line Tunnel FET

WALKE, AM; VANDOOREN, A; ROOYACKERS, R; LEONELLI, D; HIKAVYY, A; LOO, R; VERHULST, AS; KAO, KH; HUYGHEBAERT, C; GROESENEKEN, G; RAO, VR; BHUWALKA, KK; HEYNS, MM; COLLAERT, N; THEAN, AVY (IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC, 2014)