Effect of substrate temperature on the structure and optical properties of ZnO thin films deposited by reactive rf magnetron sputtering

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Effect of substrate temperature on the structure and optical properties of ZnO thin films deposited by reactive rf magnetron sputtering

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Title: Effect of substrate temperature on the structure and optical properties of ZnO thin films deposited by reactive rf magnetron sputtering
Author: SINGH, SUKHVINDER; SRINIVASA, RS; MAJOR, SS
Abstract: Zinc Oxide films were deposited on quartz substrates by reactive rf magnetron sputtering of zinc target. The effect of substrate temperature on the crystallinity and band edge luminescence has been studied. The films deposited at 300 °C exhibited the strongest c-axis orientation. AFM and Raman studies indicated that the films deposited at 600 °C possess better overall crystallinity with reduction of optically active defects, leading to strong and narrow PL emission.
URI: http://dx.doi.org/10.1016/j.tsf.2007.03.168
http://hdl.handle.net/10054/1001
http://dspace.library.iitb.ac.in/xmlui/handle/10054/1001
Date: 2007


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