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|Title: ||PREPARATION OF A THIN-FILM OF PB3O4 BY THERMAL-TREATMENT OF PBO2 FILM|
|Authors: ||KUMAR, S|
|Issue Date: ||1991|
|Publisher: ||ELSEVIER SCIENCE SA LAUSANNE|
|Citation: ||THIN SOLID FILMS, 195(1-2), 273-278|
|Abstract: ||beta-PbO2 films were deposited onto a nickel substrate by an electrochemical process. They were thermally treated in air for 24 h at different temperatures (100-650-degrees-C). Then, these films were characterized in terms of their structure, band gap, film morphology, room temperature resistivity and photoresponse. It was observed that beta-PbO2 can be converted to PbO1.57 or Pb3O4 and beta-PbO by thermal treatment at 350-degrees-C, 450-degrees-C and 650-degrees-C respectively, and Pb3O4 seems to be a better material for developing photoelectrochemical solar cells.|
|Appears in Collections:||Article|
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