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Please use this identifier to cite or link to this item: http://dspace.library.iitb.ac.in/jspui/handle/10054/7367

Title: In situ chemical vapour co-deposition of Al and Si to form diffusion coatings on TZM
Authors: MAJUMDAR, S
SHARMA, IG
RAVEENDRA, S
SAMAJDAR, I
BHARGAVA, P
Keywords: oxidation-resistant coatings
high-temperature oxidation
pack-cementation
mo-si
alloys
molybdenum
behavior
phase
interdiffusion
silicides
Issue Date: 2008
Publisher: ELSEVIER SCIENCE SA
Citation: MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 492(1-2), 211-217
Abstract: Multilayer alumino-silicide and silicide coatings were formed by in situ chemical vapour co-deposition of Al and Si on TZM (Mo-0.5Ti-0.1Zr-0.02C) alloy for improving its high-temperature oxidation resistance. MoSi2. and Mo (Si, Al)(2) layers were formed in the inner and the outer layers, respectively in the case of alumino-silicide coating. Whereas silicide coating consisted of Mo5Si3 and MoSi2 phases in the inner and the outer layers, respectively. 24-100-mu m thick coatings were formed by optimizing the pack Mixture of Al and or Si, NH4F and Al2O3 powders and conducting the experiments at 1000 degrees C for 8-36 h. MoSi2 layer showed a faster growth rate and presence of columnar grains. A small weight gain at the initial stages was observed during the oxidation tests of the coated samples under continuous or cyclic heating at 1300 degrees C in air. Neither cracks nor peeling of the coating layers were noticed after oxidation tests. (C) 2008
URI: http://dx.doi.org/10.1016/j.msea.2008.03.020
http://dspace.library.iitb.ac.in/xmlui/handle/10054/7367
http://hdl.handle.net/10054/7367
ISSN: 0921-5093
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