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Please use this identifier to cite or link to this item: http://dspace.library.iitb.ac.in/jspui/handle/10054/5899

Title: Relationship Between Pack Chemistry and Growth of Silicide Coatings on Mo-TZM Alloy
Authors: MAJUMDAR, S
SHARMA, I
SAMAJDAR, I
BHARGAVA, P
Keywords: high-temperature oxidation
si-b alloys
resistant coatings
intermetallic alloys
behavior
cementation
steels
molybdenum
kinetics
mosi2
Issue Date: 2008
Publisher: ELECTROCHEMICAL SOC INC
Citation: JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 155(12), D734-D741
Abstract: A theoretical model equation has been derived to relate the growth kinetics of silicide coating with the pack chemical composition and other processing conditions for siliconizing of Mo-TZM (Mo-0.5Ti-0.1Zr-0.02C) alloy to improve its oxidation resistance at high temperatures. A series of experiments conducted with varying pack Si (1-10 wt %) and NH4F (2-20 wt %) content, time (1-25 h), and temperature (800-1200 degrees C) confirmed the validity of the model. MoSi2 was the main coating layer formed during the siliconizing process. Optimum processing conditions were derived for doping of Al in MoSi2 to form Mo(Si,Al)(2) in the outer layer of the coating. (C) 2008 The Electrochemical Society. [DOI: 10.1149/1.2987954] .
URI: http://dx.doi.org/10.1149/1.2987954
http://dspace.library.iitb.ac.in/xmlui/handle/10054/5899
http://hdl.handle.net/10054/5899
ISSN: 0013-4651
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