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Please use this identifier to cite or link to this item: http://dspace.library.iitb.ac.in/jspui/handle/10054/5896

Title: DEPENDENCE OF PARTIAL-PRESSURE OF H2O ON PYROGENIC GROWTH OF SILICON DIOXIDE
Authors: CHANDORKAR, AN
KARULKAR, VT
RAMANATHAN, KV
Issue Date: 1985
Publisher: ELECTROCHEMICAL SOC INC
Citation: JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 132(2), 415-417
URI: http://dx.doi.org/10.1149/1.2113854
http://dspace.library.iitb.ac.in/xmlui/handle/10054/5896
http://hdl.handle.net/10054/5896
ISSN: 0013-4651
Appears in Collections:Article

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