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|Title:||Spectroscopy of silicon dioxide films grown under negative corona stress|
|Publisher:||AMER INST PHYSICS|
|Citation:||JOURNAL OF APPLIED PHYSICS, 94(4), 2308-2310|
|Abstract:||Silicon dioxide films were grown in oxygen ambient under negative corona stress at low temperatures (400-450 degreesC). Fourier transform infrared spectra of these films show a peak at 935 cm(-1) along with the conventional transverse optic mode peaks around 1074, 800, and 456 cm(-1). A broad shoulder at 1150 cm(-1) was also observed. The extra peak is attributed to the presence of SiO42- ions and could be the outcome of incomplete oxidation at the surface. The films indicated properties similar to a fully relaxed thermally grown silicon dioxide film with a contradictory nature. The results of these experiments can be comprehensively explained only by assuming the presence of some mixed phase of SiO2. (C) 2003|
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