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Please use this identifier to cite or link to this item: http://dspace.library.iitb.ac.in/jspui/handle/10054/4360

Title: HYDROGENATED MICROCRYSTALLINE SILICON FILMS PRODUCED AT LOW-TEMPERATURE BY THE HOT-WIRE DEPOSITION METHOD
Authors: DUSANE, RO
DUSANE, SR
BHIDE, VG
KSHIRSAGAR, ST
Keywords: chemical vapor-deposition
amorphous-silicon
thin-films
quality
Issue Date: 1993
Publisher: AMER INST PHYSICS
Citation: APPLIED PHYSICS LETTERS, 63(16), 2201-2203
Abstract: In this letter we report the synthesis of hydrogenated microcrystalline silicon at low temperature and without hydrogen dilution of the silane gas by the hot wire method. These films are characterized by higher dark conductivity and larger band gap compared to hydrogenated amorphous silicon. Microcrystallinity in these films is clearly established from the sharp crystalline TO-like peak in the first-order Raman spectra. The crystallite size and its volume fraction show a critical dependence on the silane flow rate.
URI: http://dx.doi.org/10.1063/1.110801
http://dspace.library.iitb.ac.in/xmlui/handle/10054/4360
http://hdl.handle.net/10054/4360
ISSN: 0003-6951
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