DSpace
 

DSpace at IIT Bombay >
IITB Publications >
Article >

Please use this identifier to cite or link to this item: http://dspace.library.iitb.ac.in/jspui/handle/10054/1581

Title: Effect of H2 dilution on Cat-CVD a-SiC:H films
Authors: SWAIN, BIBHU P
GUNDU RAO, TK
ROY, MAINAK
GUPTA, JAGANNATH
DUSANE, RO
Keywords: amorphous material
fourier transform infrared spectroscopy
graphite
raman spectra
Issue Date: 2006
Publisher: Elsevier
Citation: Thin Solid Films 501(1-2), 173-176
Abstract: Effect of hydrogen (H2) dilution of the Silane (SiH4), acetylene (C2H2) gas mixture during the deposition of hydrogenated amorphous silicon carbon alloy (a-SiC:H) films by Cat-CVD process shows that the H2 dilution induced additional carbon incorporation, leading to an increase of the carbon content in the films from 52% to 70% for the maximum H2 dilution employed. A slight increase in graphitic carbon in the films deposited with H2 dilution is also observed. A drastic increase in the optical band gap Eg from 2.5 eV for zero dilution to 3.5 eV is observed for a H2 dilution of 10 sccm. Raman spectra for the films deposited with increasing H2 dilution indicate structural changes in the amorphous network associated with increasing graphitic carbon.
URI: http://dx.doi.org/10.1016/j.tsf.2005.07.183
http://hdl.handle.net/10054/1581
http://dspace.library.iitb.ac.in/xmlui/handle/10054/1581
ISSN: 0040-6090
Appears in Collections:Article

Files in This Item:

File Description SizeFormat
5548-1.pdf180.94 kBAdobe PDFView/Open
View Statistics

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

 

Valid XHTML 1.0! DSpace Software Copyright © 2002-2010  Duraspace - Feedback