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Please use this identifier to cite or link to this item: http://dspace.library.iitb.ac.in/jspui/handle/10054/1478

Title: Structure and stability of 2.4 nm period amorphous Ni–Nb/C multilayers
Authors: VITTA, SATISH
Keywords: laser ablation
multilayers
nickel alloys
pulsed laser applications
Issue Date: 1999
Publisher: Elsevier
Citation: Materials Science and Engineering B 57(2), 165-169
Abstract: Amorphous Ni–Nb/C multilayers with a period of 2.4 nm were prepared by pulsed laser ablation deposition. The as-deposited multilayers were found to have an interdiffused Ni1/3Nb1/3C1/3 layer present at the two interfaces; Ni1/2Nb1/2/C and C/N1/2Nb1/2. The specular reflectivity and diffuse scattering studies show that the interface roughness is chemical and not morphological in origin. The structural studies performed using X-ray scattering techniques after a period of 2.5 years from deposition show that the behaviour does not change with time. These results indicate that the multilayered structure is temporally stable in spite of the strong composition dependent driving force for chemical homogenization. The structural stability against homogenization is due to the presence of an amorphous Ni1/3Nb1/3C1/3 layer present at the interfaces which acts as a diffusion barrier.
URI: 10.1016/S0921-5107(98)00419-X
http://hdl.handle.net/10054/1478
http://dspace.library.iitb.ac.in/xmlui/handle/10054/1478
ISSN: 0921-5107
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