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|Title: ||Dissociation kinetics of molecular hydrogen in a microwave plasma and its influence on the hydrogen content in diamond films|
|Authors: ||SHARDA, T|
|Keywords: ||chemical vapor-deposition|
|Issue Date: ||1996|
|Publisher: ||PERGAMON-ELSEVIER SCIENCE LTD|
|Citation: ||SOLID STATE COMMUNICATIONS, 98(10), 879-883|
|Abstract: ||Double probe measurements were performed in a microwave plasma at various hydrogen pressures. Electron temperature increases with the growth pressure. Electron density is determined to be 5.6, 7.2 and 8 x 10(11) cm(-3) within 20% accuracy, at 20, 40 and 70 Torr, respectively. The dissociation rate of hydrogen increases with pressure. Elastic recoil detection analysis was used to measure the relative H concentration in the films. The stress in the films changes systematically as the H content increases. We find that as 1 h H atom concentration in the plasma increases, the concentration of H in the films goes down. Copyright (C) 1996|
|Appears in Collections:||Article|
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