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Please use this identifier to cite or link to this item: http://dspace.library.iitb.ac.in/jspui/handle/100/2398

Title: Characterization of multiferroic thin films directly deposited on silicon for novel device applications
Authors: PRASHANTHI, K
PALKAR, VR
Issue Date: 2010
Publisher: IEEE
Citation: INEC: 2010 3RD INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1 AND 2,900-901
Abstract: we have investigated the multiferroic and dielectric properties in Dy modified BiFeO(3) thin films deposited directly on silicon using pulsed laser deposition (PLD) technique. The results support the usability of these films in multiferroic based MEMS devices as well as gate dielectrics for future CMOS applications.
URI: http://dspace.library.iitb.ac.in/xmlui/handle/10054/15742
http://hdl.handle.net/100/2398
ISBN: 978-1-4244-3543-2
Appears in Collections:Proceedings papers

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