Correspondence between magnetoresistance and magnetization in Co/Cu multilayers studied at higher spacer layer thickness

Abstract

A series of [Cu(t(Cu))/Co(25 angstrom)](25) multilayers at higher spacer layer thickness have been deposited by dc magnetron sputtering. Magnetoresistance (MR) measurements have been carried out at different temperatures. MR curves showed hysteresis by displaying peaks at magnetic field H. The field values exhibiting the maximum resistance in the magnetoresistance curve (H(p)) were greater than the coercivity (H(c)). The correspondence between the shape of the MR curve and that of the magnetization curve has been established and observed peak splitting in MR curves is attributed to a hardening in the magnetization reversal of some magnetic grains.