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Please use this identifier to cite or link to this item: http://dspace.library.iitb.ac.in/jspui/handle/100/1779

Title: Charge trapping behaviour in deposited and grown thin metal-oxide-semiconductor gate dielectrics
Authors: RAO, VR
HANSCH, W
BAUMGARTNER, H
EISELE, I
SHARMA, DK
VASI, J
GRABOLLA, T
Issue Date: 1997
Publisher: ELSEVIER SCIENCE SA LAUSANNE
Citation: THIN SOLID FILMS,296,37-40
Abstract: In this study we compared the charge trapping characteristics of low pressure chemical vapour deposited (LPCVD) oxide and remote plasma enhanced chemical vapour deposited (RPECVD) oxide with two types of thermally grown oxide, namely high-pressure grown oxide (HIPOX) and the standard thermal dry oxide. The deposited oxides show enhanced Fowler-Nordheim tunnelling currents compared with the thermal oxides. Our results an charge trapping characteristics under high-field stressing and irradiation show that the deposited oxides exhibit very large electron trapping compared with the grown oxides and that these electron traps in the deposited oxides reside close to the Si-SiO2 interface and hence can affect the device reliability. (C) 1997 Elsevier Science S.A.
URI: http://dspace.library.iitb.ac.in/xmlui/handle/10054/15022
http://hdl.handle.net/100/1779
ISSN: 0040-6090
Appears in Collections:Proceedings papers

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