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| Title: | A study of 100 nm channel length asymmetric channel MOSFET by using charge pumping |
| Authors: | MAHAPATRA, S RAO, VR PARIKH, CD VASI, J CHENG, B WOO, JCS |
| Issue Date: | 1999 |
| Publisher: | ELSEVIER SCIENCE BV |
| Citation: | MICROELECTRONIC ENGINEERING,48,193-196 |
| Abstract: | Lateral Asymmetric Channel (LAC) MOSFETs with channel lengths down to 0.1 mu m have been fabricated and characterized for their electrical performance. Using charge pumping, we show, for the first time, channel V-T profiles obtained experimentally, demonstrating realization of asymmetric channel MOSFETs down to 0.1 mu m channel lengths. Our detailed experimental characterizations show improved performance for LAC MOSFETs over conventional MOSFETs, in addition to excellent hot-carrier reliability. Based on 2-D device simulation results, we attribute the improved hot-carrier reliability in LAC MOSFETs to the reduced peak lateral electric field in the channel. |
| URI: | http://dx.doi.org/10.1016/S0167-9317(99)00369-X http://dspace.library.iitb.ac.in/xmlui/handle/10054/14859 http://hdl.handle.net/100/1691 |
| ISSN: | 0167-9317 |
| Appears in Collections: | Proceedings papers
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