DSpace
 

DSpace at IIT Bombay >
IITB Publications >
Proceedings papers >

Please use this identifier to cite or link to this item: http://dspace.library.iitb.ac.in/jspui/handle/100/1479

Title: Development of low temperature RF magnetron sputtered ITO films on flexible substrate
Authors: MUNESHWAR, TP
VARMA, V
MESHRAM, N
SONI, S
DUSANE, RO
Keywords: oxygen partial-pressure
thin-films
oxide
microstructure
Issue Date: 2010
Publisher: ELSEVIER SCIENCE BV
Citation: SOLAR ENERGY MATERIALS AND SOLAR CELLS,94(9)1448-1450
Abstract: Indium tin oxide (ITO) is one of the important materials used as transparent conducting oxide (TCO) layer in thin film solar cells, digital displays and other similar applications. For applications involving flexible polymeric substrates, it is important that deposition of ITO is carried out at near room temperature. This requirement puts constraint on stoichiometry leading to undesired electrical and optical properties. Effect of oxygen partial pressure on ITO films deposited on flexible Kapton (R) by the RF magnetron sputtering is reported in this paper. (C) 2010 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.solmat.2010.03.037
http://dspace.library.iitb.ac.in/xmlui/handle/10054/14630
http://hdl.handle.net/100/1479
ISSN: 0927-0248
Appears in Collections:Proceedings papers

Files in This Item:

There are no files associated with this item.

View Statistics

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

 

Valid XHTML 1.0! DSpace Software Copyright © 2002-2010  Duraspace - Feedback