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Please use this identifier to cite or link to this item: http://dspace.library.iitb.ac.in/jspui/handle/100/14364

Title: Facile one-step transfer process of graphene
Authors: BAJPAI, R
ROY, S
JAIN, L
KULSHRESTHA, N
HAZRA, KS
MISRA, DS
Keywords: FEW-LAYER GRAPHENE
CHEMICAL-VAPOR-DEPOSITION
RAMAN-SPECTROSCOPY
SINGLE-LAYER
HIGH-QUALITY
LARGE-AREA
FILMS
NANOTUBES
Issue Date: 2011
Publisher: IOP PUBLISHING LTD
Citation: NANOTECHNOLOGY,22(22)-
Abstract: Chemical vapour deposition (CVD) is emerging as a popular method for growing large-area graphene on metal substrates. For transferring graphene to other substrates the technique generally used involves deposition of a polymer support with subsequent etching of the metal substrate. Here we report a simpler one-step transfer process. Few-layer graphene (FLG) grown on a Cu substrate were transferred to a silanized wafer by just pressing them together. Hydrogen bonding between the hydroxyl group on FLG and the amine group on silane molecules facilitate the transfer.
URI: http://dx.doi.org/10.1088/0957-4484/22/22/225606
http://dspace.library.iitb.ac.in/jspui/handle/100/14364
ISSN: 0957-4484
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