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| Title: | Facile one-step transfer process of graphene |
| Authors: | BAJPAI, R ROY, S JAIN, L KULSHRESTHA, N HAZRA, KS MISRA, DS |
| Keywords: | FEW-LAYER GRAPHENE CHEMICAL-VAPOR-DEPOSITION RAMAN-SPECTROSCOPY SINGLE-LAYER HIGH-QUALITY LARGE-AREA FILMS NANOTUBES |
| Issue Date: | 2011 |
| Publisher: | IOP PUBLISHING LTD |
| Citation: | NANOTECHNOLOGY,22(22)- |
| Abstract: | Chemical vapour deposition (CVD) is emerging as a popular method for growing large-area graphene on metal substrates. For transferring graphene to other substrates the technique generally used involves deposition of a polymer support with subsequent etching of the metal substrate. Here we report a simpler one-step transfer process. Few-layer graphene (FLG) grown on a Cu substrate were transferred to a silanized wafer by just pressing them together. Hydrogen bonding between the hydroxyl group on FLG and the amine group on silane molecules facilitate the transfer. |
| URI: | http://dx.doi.org/10.1088/0957-4484/22/22/225606 http://dspace.library.iitb.ac.in/jspui/handle/100/14364 |
| ISSN: | 0957-4484 |
| Appears in Collections: | Article
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