DSpace
 

DSpace at IIT Bombay >
IITB Publications >
Article >

Please use this identifier to cite or link to this item: http://dspace.library.iitb.ac.in/jspui/handle/100/14363

Title: Thinning of multilayer graphene to monolayer graphene in a plasma environment
Authors: HAZRA, KS
RAFIEE, J
RAFIEE, MA
MATHUR, A
ROY, SS
MCLAUHGLIN, J
KORATKAR, N
MISRA, DS
Keywords: GRAPHITE OXIDE
SINGLE-LAYER
FILMS
PHASE
KINETICS
SHEETS
GAS
Issue Date: 2011
Publisher: IOP PUBLISHING LTD
Citation: NANOTECHNOLOGY,22(2)-
Abstract: We present a facile approach to transform multilayer graphene to single-layer graphene in a gradual thinning process. Our technique is based upon gradual etching of multilayer graphene in a hydrogen and nitrogen plasma environment. High resolution transmission microscopy, selected area electron diffraction and Raman spectroscopy confirm the transformation of multilayer graphene to monolayer graphene at a substrate temperature of similar to 400 degrees C. The shift in the position of the G-band peak shows a perfect linear dependence with substrate temperature, which indicates a controlled gradual etching process. Selected area electron diffraction also confirmed the removal of functional groups from the graphene surface due to the plasma treatment. We also show that plasma treatment can be used to engineer graphene nanomesh structures.
URI: http://dx.doi.org/10.1088/0957-4484/22/2/025704
http://dspace.library.iitb.ac.in/jspui/handle/100/14363
ISSN: 0957-4484
Appears in Collections:Article

Files in This Item:

There are no files associated with this item.

View Statistics

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

 

Valid XHTML 1.0! DSpace Software Copyright © 2002-2010  Duraspace - Feedback