Photonic crystal waveguides by direct writing of e-beam on self-assembled photonic crystals

Abstract

Direct electron beam lithography technique is used for writing a variety of waveguide structures on thin films of polymethyl methacrylate (PMMA) and self-assembled three-dimensionally ordered photonic crystals made up of PMMA colloidal spheres. The waveguide structures fabricated on both these type of samples are characterized by scanning electron microscope and optical microscope images.