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|Title: ||The magnetic properties and microstructure of strontium ferrite films with perpendicular and in-plane magnetic anisotropy|
|Authors: ||ACHARYA, BR|
|Issue Date: ||1997|
|Publisher: ||IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC|
|Citation: ||IEEE TRANSACTIONS ON MAGNETICS,33(5)3640-3642|
|Abstract: ||The texture and the easy axis of magnetization of Strontium ferrite (SrFe12O19) thin films can be controlled by changing power of rf sputtering, In-plane magnetic anisotropy is developed at a sputtering power of 330 W (7.5 W/cm(2)), whereas strong perpendicular magnetic anisotropy (Ku similar to 1 x 10(6) erg/cc) is induced at 60 W power (1.3 W/cm(2)). Further control over coercivity and morphology san be achieved by changing the ratio R, between oxygen and in the sputtering gas, Coercivity decreases with R. Films deposited without oxygen exhibit higher coercivity and less intergranular interaction as compared to films sputtered with oxygen.|
|Appears in Collections:||Proceedings papers|
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