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Issue Date	Title	Author(s)
2002	Improvement in gate dielectric quality of ultra thin a : SiN : H MNS capacitor by hydrogen etching of the substrate	WAGHMARE, PC; PATIL, SB; DUSANE, RO; RAO, VR
2002	Reliability issues of ultra thin silicon nitride (a-SiN : H) by hot wire CVD for deep sub-micron CMOS technologies	WAGHMARE, PC; PATIL, SB; KUMBHAR, A; DUSANE, RO; RAO, VR
2002	Ultra-thin silicon nitride by hot wire chemical vapor deposition (HWCVD) for deep sub-micron CMOS technologies	WAGHMARE, PC; PATIL, SB; KUMBHAR, A; DUSANE, RO; RAO, VR

Showing results 1 to 3 of 3