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Issue Date	Title	Author(s)
2003	Highly conducting doped poly-Si deposited by hot wire CVD and its applicability as gate material for CMOS devices	PATIL, SAMADHAN B; VAIRAGAR, ANAND V; KUMBHAR, ALKA A; SAHU, LAXMI; RAMGOPAL RAO, V; VENKATRAMANI, N; DUSANE, RO; SCHROEDER, B
2006	Internal stress in Cat-CVD microcrystalline Si:H thin films	SAHU, LAXMI; KALE, NITIN; KULKARNI, NILESH; PINTO, R; DUSANE, RO; SCHRÖDER, B

Showing results 1 to 2 of 2