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Browsing by Author PATIL, SB

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Showing results 1 to 14 of 14
Issue DateTitleAuthor(s)
2012Characterization of agglomeration state in nanocrystalline 3YSZ powders through pressure-displacement curves and nanoindentation of green compactsPATIL, SB; BHARGAVA, P
1990ESTIMATION OF A QUANTITATIVE AIR-QUALITY IMPACT ASSESSMENT SCORE FOR A THERMAL POWER-PLANTPATIL, SB; PATIL, RS
2002Gas phase chemistry study during deposition of a-Si : H and mu c-Si : H films by HWCVD using quadrupole mass spectrometryPATIL, SB; KUMBHAR, AA; DUSANE, RO
2002Improvement in gate dielectric quality of ultra thin a : SiN : H MNS capacitor by hydrogen etching of the substrateWAGHMARE, PC; PATIL, SB; DUSANE, RO; RAO, VR
2013Influence of Ethanol Amount During Washing on Deagglomeration of Co-Precipitated Calcined Nanocrystalline 3YSZ PowdersPATIL, SB; JENA, AK; BHARGAVA, P
2000Low temperature hot-wire CVD nitrides for deep sub-micron CMOS technologiesPATIL, SB; VAIDYA, S; KUMBHAR, A; DUSANE, RO; CHANDORKAR, AN; RAO, VR
2001Low temperature silicon nitride deposited by Cat-CVD for deep submicron metal-oxide-semiconductor devicesPATIL, SB; KUMBHAR, A; WAGHMARE, P; RAO, VR; DUSANE, RO
1983MAGNETIC AND MOSSBAUER STUDIES OF SOME MIXED COBALTITES OF THE LANTHANIDES AND ALKALI-METALSCHAKRABARTY, DK; BANDYOPADHYAY, A; PATIL, SB; SHRINGI, SN
1982MAGNETIC CLUSTERS IN SOME BARIUM LANTHANIDE COBALTATESBANDYOPADHYAY, A; PATIL, SB; CHAKRABARTY, DK; RADHAKRISHNAMURTY, C
1981MOSSBAUER SPECTROSCOPIC STUDIES OF THE BAXLA1-XCOO3 SYSTEMPATIL, SB; CHAKRABARTY, DK; BABU, MV; SHRINGI, SN
2002Reliability issues of ultra thin silicon nitride (a-SiN : H) by hot wire CVD for deep sub-micron CMOS technologiesWAGHMARE, PC; PATIL, SB; KUMBHAR, A; DUSANE, RO; RAO, VR
1979STRUCTURAL, ELECTRICAL, AND MAGNETIC-PROPERTIES IN THE SYSTEM BAXLA1-XCOO3PATIL, SB; KEER, HV; CHAKRABARTY, DK
1983THERMAL CHARACTERIZATION OF THE NON-STOICHIOMETRY AND CATALYTIC ACTIVITY OF BAXLN1-XCOO3 (LN=LA, ND, SM AND DY) COMPOUNDSPATIL, SB; BANDYOPADHYAY, A; CHAKRABARTY, DK; KEER, HV
2002Ultra-thin silicon nitride by hot wire chemical vapor deposition (HWCVD) for deep sub-micron CMOS technologiesWAGHMARE, PC; PATIL, SB; KUMBHAR, A; DUSANE, RO; RAO, VR
Showing results 1 to 14 of 14

 

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