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Issue DateTitleAuthor(s)
2010Implications of fin width scaling on variability and reliability of high-k metal gate FinFETsCHABUKSWAR, S; MAJI, D; MANOJ, CR; ANIL, KG; RAO, VR; CRUPI, F; MAGNONE, P; GIUSI, G; PACE, C; COLLAERT, N
2007Reduction of the anomalous VT behavior in MOSFETs with high-kappa/metal gate stacksFERAIN, I; PANTISANO, L; KOTTANTHARAYIL, A; PETRY, J; TROJMAN, L; COLLAERT, N; JURCZAK, M; DE MEYER, K
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