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Issue Date	Title	Author(s)
1991	ELECTRICAL-PROPERTIES OF SILICON DIOXIDE FILMS GROWN BY INDUCTIVELY COUPLED RF PLASMA ANODIZATION	CHOKSI, AJ; LAL, R; CHANDORKAR, AN
1992	GROWTH-KINETICS OF SILICON DIOXIDE ON SILICON IN AN INDUCTIVELY COUPLED RF PLASMA AT CONSTANT ANODIZATION CURRENTS	CHOKSI, AJ; LAL, R; CHANDORKAR, AN
1992	Improved electrical-properties of Silicon dioxide films for MOS gate dielectrics grown in an inductively coupled RF plasma	CHOKSI, AJ; LAL, R; CHANDORKAR, AN

Showing results 1 to 3 of 3