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Browsing by Author MAHAPATRA, S

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Issue DateTitleAuthor(s)
2013Band gap bowing and band offsets in relaxed and strained Si1-xGex alloys by employing a new nonlinear interpolation schemeSANT, S; LODHA, S; GANGULY, U; MAHAPATRA, S; HEINZ, FO; SMITH, L; MOROZ, V; GANGULY, S
2002CHISEL flash EEPROM - Part II: ReliabilityMAHAPATRA, S; SHUKURI, S; BUDE, J
2002CHISEL flash EEPROM - Part I: Performance and scalingMAHAPATRA, S; SHUKURI, S; BUDE, J
2003CHISEL programming operation of scaled NOR flash EEPROMs - Effect of voltage scaling, device scaling and technological parametersMOHAPATRA, NR; NAIR, DR; MAHAPATRA, S; RAO, VR; SHUKURI, S; BUDE, JD
2003CHISEL programming operation of scaled NOR flash EEPROMs-effect of voltage scaling, device scaling and technological parametersMAHAPATRA, S; MOHAPATRA, NR; NAIR, DR; RAMGOPAL RAO, V; SHUKURI, S; BUDE, JD
2009Click' Chemistry on Sugar-Derived Alkynes: A Tandem 'Click-Click' Approach to BistriazolesKALIAPPAN, KP; KALANIDHI, P; MAHAPATRA, S
2009A Common Framework of NBTI Generation and Recovery in Plasma-Nitrided SiON p-MOSFETsDEORA, S; MAHETA, VD; ISLAM, AE; ALAM, MA; MAHAPATRA, S
2009A Comparative NBTI Study of HfO(2), HfSiO(x), and SiON p-MOSFETs Using UF-OTF I(DLIN) TechniqueDEORA, S; MAHETA, VD; BERSUKER, G; OLSEN, C; AHMED, KZ; JAMMY, R; MAHAPATRA, S
2013A Comparative Study of Different Physics-Based NBTI ModelsMAHAPATRA, S; GOEL, N; DESAI, S; GUPTA, S; JOSE, B; MUKHOPADHYAY, S; JOSHI, K; JAIN, A; ISLAM, AE; ALAM, MA
2002A comparative study of scaling properties of MOS transistors in CHE and CHISEL injection regimeMOHAPATRA, NR; MAHAPATRA, S; RAO, VR
2001Comparison of sub-bandgap impact ionization in sub-100 nm conventional and lateral asymmetrical channel nMOSFETsANIL, K; MAHAPATRA, S; RAO, VR; EISELE, I
2010A comprehensive analysis on scaling prospects of dual-bit channel engineered SONOS NOR-flash EEPROM cellsDATTA, A; MAHAPATRA, S
2007A comprehensive model for PMOS NBTI degradation: Recent progressALAM, MA; KUFLUOGLU, H; VARGHESE, D; MAHAPATRA, S
2005A comprehensive model of PMOS NBTI degradationALAM, MA; MAHAPATRA, S
2006Comprehensive simulation of program, erase and retention in charge tapping flash memoriesPAUL, A; CHSRIDHAR; GEDAM, S; MAHAPATRA, S
2008A comprehensive study of flicker noise in plasma nitrided SiON p-MOSFETs : process dependence of pre-existing and NBTI stress generated trap distribution profilesKAPILA, G; GOYAL, N; MAHETA, VD; OLSEN, C; AHMED, K; MAHAPATRA, S
2000A comprehensive study of hot-carrier induced interface and oxide trap distributions in MOSFETs using a novel charge pumping techniqueMAHAPATRA, S; PARIKH, CD; RAMGOPAL RAO, V; VISWANATHAN, CR; VASI, J
2004A comprehensive trapped charge profiling technique for SONOS flash EEPROMsNAIR, PR; BHARATH KUMAR, P; SHARMA, RAVINDER; MAHAPATRA, S; KAMOHARA, S
2005Controlling injected electron and hole profiles for better reliability of split gate SONOSSRIDHAR, K; BHARATH KUMAR, P; MAHAPATRA, S; MURAKAMI, E; KAMOHARA, S
1980CORNER FUNCTION-ANALYSIS OF MICROSTRIP TRANSMISSION-LINESSESHADRI, TK; MAHAPATRA, S; RAJAIAH, K
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