DSpace
 

DSpace at IIT Bombay >

Browsing by Author DUSANE, RO

Jump to: 0-9 A B C D E F G H I J K L M N O P Q R S T U V W X Y Z
or enter first few letters:   
Sort by: In order: Results/Page Authors/Record:
Showing results 35 to 51 of 51
< previous 
Issue DateTitleAuthor(s)
2006One-dimensional simulation study of microcrystalline silicon thin films for solar cell and thin film transistor applications using AMPS-1DTRIPATHI,S; VENKATARAMANI, N; DUSANE, RO; SCHROEDER, B
2001Photoluminescent, wide-bandgap a-SiC:H alloy films deposited by Cat- CVD using acetyleneKUMBHAR, ALKA A; PATIL, SAMADHAN B; KUMAR, SANJAY; LAL, RAKESH; DUSANE, RO
1996p-i interface engineering and i-layer control of hot-wire a-Si:H based p-i-n solar cells using in-situ ellipsometryBAUER, S; DUSANE, RO; HERBST, W; DIEHL, F; SCHRODER, B
2006Potential of Cat-CVD deposited a-SiC : H as diffusion barrier layer on low-k HSQ films for ULSISINGH, SK; KUMBHAR, AA; KOTHARI, M; DUSANE, RO
2003Preliminary results on a-SiC:H based thin film light emitting diode by hot wire CVDPATIL, SAMADHAN B; KUMBHAR, ALKA A; SARASWAT, SHWETA; DUSANE, RO
2002Reliability issues of ultra thin silicon nitride (a-SiN : H) by hot wire CVD for deep sub-micron CMOS technologiesWAGHMARE, PC; PATIL, SB; KUMBHAR, A; DUSANE, RO; RAO, VR
2006Repairing plasma-damaged low-k HSQ films with trimethylchlorosilane treatmentSINGH, SUNIL KUMAR; KUMBHAR, ALKA A; DUSANE, RO
2006Resisting oxygen plasma damage in low-k hydrogen silsesquioxane films by hydrogen plasma treatmentSINGH, SUNIL KUMAR; KUMBHAR, ALKA A; DUSANE, RO
2003Revisiting the B-factor variation in a-SiC:H deposited by HWCVDSWAIN, BIBHU P; PATIL, SAMADHAN B; KUMBHAR, ALKA A; DUSANE, RO
2006Structural characterization of electrodeposited nanophase Ni-Cu alloysGHOSH, SK; GROVER, AK; DEY, GK; KULKARNI, UD; DUSANE, RO; SURI, AK; BANERJEE, S
1994STRUCTURAL DEFECTS IN GLOW-DISCHARGE A-SI-C-H INVESTIGATED BY POSITRON-ANNIHILATION SPECTROSCOPYDUSANE, RO; RAJARSHI, SV; GOYAL, DJ; BHIDE, VG; NAGRAJAN, T
2002Suppression of boron penetration by hot wire CVD polysiliconVAIRAGAR, AV; PATIL, SAMADHAN B; PETE, DJ; WAGHMARE, PARAG C; DUSANE, RO; VENKATRAMANI, N; RAMGOPAL RAO, V
2013Synthesis of silicon nanowires using tin catalyst by hot wire chemical vapor processingMESHRAM, N; KUMBHAR, A; DUSANE, RO
2006Thermodynamic analysis of gas phase chemistry in hot wire chemical vapor deposition of a-Si:H and μc-Si:HADHIKARI, SUBHRA; VISWANATHAN, NN; DUSANE, RO
2006Time resolved photoluminescence of hydrogenated amorphous silicon carbon thin films deposited by HWCVDSWAIN, BP; RAO, TKG; DUSANE, RO
2007Tribological behaviour and residual stress of electrodeposited Ni/Cu multilayer films on stainless steel substrateGHOSH, SK; LIMAYE, PK; SWAIN, BP; SONI, NL; AGRAWAL, RG; DUSANE, RO; GROVER, AK
2002Ultra-thin silicon nitride by hot wire chemical vapor deposition (HWCVD) for deep sub-micron CMOS technologiesWAGHMARE, PC; PATIL, SB; KUMBHAR, A; DUSANE, RO; RAO, VR
Showing results 35 to 51 of 51
< previous 

 

Valid XHTML 1.0! DSpace Software Copyright © 2002-2010  Duraspace - Feedback