Browsing by Author DUSANE, RO

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Issue DateTitleAuthor(s)
2006Effect of filament temperature on HWCVD deposited a-SiC : HSWAIN, BP; DUSANE, RO
2006Effect of H2 dilution on Cat-CVD a-SiC:H filmsSWAIN, BIBHU P; GUNDU RAO, TK; ROY, MAINAK; GUPTA, JAGANNATH; DUSANE, RO
2015Effect of SPPS Process Parameters on In-Flight Particle Generation and Splat Formation to Achieve Pure alpha-Al2O3 CoatingsSIVAKUMAR, G; RAMAKRISHNA, M; DUSANE, RO; JOSHI, SV
2007Effect of substrate temperature on HWCVD deposited a-SiC : H filmSWAIN, BP; DUSANE, RO
2002Electrically induced junction MOSFET for high performance sub-50nm CMOS technologyDIXIT, A; DUSANE, RO; RAO, VR
2016Emitter passivation of silicon solar cell via organic coating at room temperatureSHINDE, OS; FUNDE, AM; AGARWAL, M; JADKAR, SR; MAHAMUNI, SR; DUSANE, RO; DHERE, NG; GHAISAS, SV
2006Enhancement of moisture resistance of spin-on low-k HSQ films by hot wire generated atomic hydrogen treatmentKUMBHAR, ALKA A; SINGH, SUNIL KUMAR; DUSANE, RO
2014Fabrication of high gauge factor piezoresistive nanocrystalline Si film using aluminum-induced crystallization of HWCVD deposited a-Si:HPANDEY, V; SANAGAVARAPU, L; DUSANE, RO
2006Further insights into the mechanism of hydrogen-plasma surface passivation of low-dielectric constant hydrogen silsesquioxane (HSQ)SINGH, SK; KUMBHAR, AA; DUSANE, RO; BOCK, W
2002Gas phase chemistry study during deposition of a-Si : H and mu c-Si : H films by HWCVD using quadrupole mass spectrometryPATIL, SB; KUMBHAR, AA; DUSANE, RO
2010High deposition rate device quality a-Si:H films at low substrate temperature by HWCVD techniqueSONI, SK; PHATAK, A; DUSANE, RO
2006High magnetoresistance and low coercivity in electrodeposited Co/Cu granular multilayersGHOSH, SK; GROVER, AK; CHOWDHURY, P; GUPTA, SK; RAVIKUMAR, G; ASWAL, DK; KUMAR, MS; DUSANE, RO
2001Highly conducting doped microcrystalline silicon (μc-Si:H) at very low substrate temperature by Cat-CVDDUSANE, RO; DIEHL, FRANK; WEBER, U; SCHRÖDER, B
2003Highly conducting doped poly-Si deposited by hot wire CVD and its applicability as gate material for CMOS devicesPATIL, SAMADHAN B; VAIRAGAR, ANAND V; KUMBHAR, ALKA A; SAHU, LAXMI; RAMGOPAL RAO, V; VENKATRAMANI, N; DUSANE, RO; SCHROEDER, B
2008Hot wire chemical vapor processing (HWCVP) - a prospective tool for VLSIDUSANE, RO
2006Hot-wire chemical-vapor-deposited nanometer range a-SiC : H diffusion barrier films for ultralarge-scale-integrated applicationSINGH, SK; KUMBHAR, AA; DUSANE, RO; BOCK, W
2014Hybrid Plasma-Sprayed Thermal Barrier Coatings Using Powder and Solution Precursor FeedstockJOSHI, SV; SIVAKUMAR, G; RAGHUVEER, T; DUSANE, RO
2014Hybrid Plasma-Sprayed Thermal Barrier Coatings Using Powder and Solution Precursor FeedstockJOSHI, SV; SIVAKUMAR, G; RAGHUVEER, T; DUSANE, RO
2006Improved pitting corrosion behaviour of electrodeposited nanocrystalline Ni–Cu alloys in 3.0 wt.% NaCl solutionGHOSH, SK; DEY, GK; DUSANE, RO; GROVER, AK